Figure 4. a) Co-ZIF@rGO-F-25在電流密度0.1 A g−1時恒流充放電曲線;b) Co-ZIF納米片、Co-ZIF@rGO-P、Co-ZIF@rGO-F-25在0.1 A g−1電流密度下的循環(huán)性能;c) Co-ZIF@rGO-F-25在不同電流密度下的恒電流充放電曲線;d) Co-ZIF納米片,Co-ZIF@rGO-P,Co-ZIF@rGO-F-25的倍率性能。
Figure 5. a) Co-ZIF納米片,Co-ZIF@rGO-P, Co-ZIF@rGO-F-25在較高電流密度為1 A g−1時的長期循環(huán)性能;循環(huán)測試后Co-ZIF@rGO-F-25負極的b) TEM圖像,c) XRD譜; d) Co-ZIF @rGO-F-25中Co-ZIF納米片的平面間距的示意圖。
相關(guān)研究成果于2019年由華東師范大學(xué)Chengzhong Yu課題組,發(fā)表在Advanced Science (https://doi.org/10.1002/advs.201901480)上。原文:A General Approach to Direct Growth of Oriented Metal–Organic Framework Nanosheets on Reduced Graphene Oxides